https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=File%3AWF_2E02_mar23_2011-030.jpgFile:WF 2E02 mar23 2011-030.jpg - Revision history2026-05-08T09:46:09ZRevision history for this page on the wikiMediaWiki 1.43.3https://labadviser.nanolab.dtu.dk//index.php?title=File:WF_2E02_mar23_2011-030.jpg&diff=4967&oldid=prevJml: The profiles of the 211 nm thick zep resist wafers (The E-batch of march 23 2011). The wafers have been over-exposed in the E-beam (400 µC/cm2) to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wide2011-04-07T13:17:42Z<p>The profiles of the 211 nm thick zep resist wafers (The E-batch of march 23 2011). The wafers have been over-exposed in the E-beam (400 µC/cm2) to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wide</p>
<p><b>New page</b></p><div>The profiles of the 211 nm thick zep resist wafers (The E-batch of march 23 2011). The wafers have been over-exposed in the E-beam (400 µC/cm2) to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.</div>Jml