https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=File%3AWF_2C2_feb2011-030.jpgFile:WF 2C2 feb2011-030.jpg - Revision history2026-05-05T19:39:22ZRevision history for this page on the wikiMediaWiki 1.43.3https://labadviser.nanolab.dtu.dk//index.php?title=File:WF_2C2_feb2011-030.jpg&diff=4807&oldid=prevJml: Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 444, time 300 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.2011-03-18T10:42:38Z<p>Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 444, time 300 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.</p>
<p><b>New page</b></p><div>Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 444, time 300 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.</div>Jml