https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=File%3AWF_2C1_feb2011profile_060.jpgFile:WF 2C1 feb2011profile 060.jpg - Revision history2026-05-09T02:51:22ZRevision history for this page on the wikiMediaWiki 1.43.3https://labadviser.nanolab.dtu.dk//index.php?title=File:WF_2C1_feb2011profile_060.jpg&diff=4803&oldid=prevJml: The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.2011-03-18T10:29:33Z<p>The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.</p>
<p><b>New page</b></p><div>The profiles of the 180 nm thick zep resist wafers. The wafers have been over-exposed in the E-beam to make sure that all structures are opened - therefore the 30, 60, 90, 120 and 150 nm lines are somewhat wider.</div>Jml