https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=File%3AWF_2A4_feb06_2011-030.jpgFile:WF 2A4 feb06 2011-030.jpg - Revision history2026-05-08T04:48:51ZRevision history for this page on the wikiMediaWiki 1.43.3https://labadviser.nanolab.dtu.dk//index.php?title=File:WF_2A4_feb06_2011-030.jpg&diff=4709&oldid=prevJml: Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.2011-03-15T13:41:32Z<p>Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.</p>
<p><b>New page</b></p><div>Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.</div>Jml