https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=File%3ARIE1_150nitride_bgenitr_3.5min.tif 2026-05-12T21:41:17Z Revision history for this page on the wiki MediaWiki 1.43.3 https://labadviser.nanolab.dtu.dk//index.php?title=File:RIE1_150nitride_bgenitr_3.5min.tif&diff=3709&oldid=prev 2009-09-21T09:35:56Z

<p>uploaded a new version of &quot;<a href="/index.php?title=File:RIE1_150nitride_bgenitr_3.5min.tif" title="File:RIE1 150nitride bgenitr 3.5min.tif">Image:RIE1 150nitride bgenitr 3.5min.tif</a>&quot;: RIE1 etch profile - 150 nm silicon nitride - recipe &quot;BGE_NITR&quot; (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been</p> <table style="background-color: #fff; color: #202122;" data-mw="interface"> <tr class="diff-title" lang="en"> <td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td> <td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 11:35, 21 September 2009</td> </tr><tr><td colspan="2" class="diff-notice" lang="en"><div class="mw-diff-empty">(No difference)</div> </td></tr></table>

Pvl https://labadviser.nanolab.dtu.dk//index.php?title=File:RIE1_150nitride_bgenitr_3.5min.tif&diff=3708&oldid=prev 2009-09-21T09:24:24Z

<p>uploaded a new version of &quot;<a href="/index.php?title=File:RIE1_150nitride_bgenitr_3.5min.tif" title="File:RIE1 150nitride bgenitr 3.5min.tif">Image:RIE1 150nitride bgenitr 3.5min.tif</a>&quot;: RIE1 etch profile - 150 nm silicon nitride - recipe &quot;BGE_NITR&quot; (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been</p> <table style="background-color: #fff; color: #202122;" data-mw="interface"> <tr class="diff-title" lang="en"> <td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td> <td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 11:24, 21 September 2009</td> </tr><tr><td colspan="2" class="diff-notice" lang="en"><div class="mw-diff-empty">(No difference)</div> </td></tr></table>

Pvl https://labadviser.nanolab.dtu.dk//index.php?title=File:RIE1_150nitride_bgenitr_3.5min.tif&diff=3707&oldid=prev 2009-09-21T09:17:05Z

<p>uploaded a new version of &quot;<a href="/index.php?title=File:RIE1_150nitride_bgenitr_3.5min.tif" title="File:RIE1 150nitride bgenitr 3.5min.tif">Image:RIE1 150nitride bgenitr 3.5min.tif</a>&quot;: RIE1 etch profile - 150 nm silicon nitride - recipe &quot;BGE_NITR&quot; (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been</p> <table style="background-color: #fff; color: #202122;" data-mw="interface"> <tr class="diff-title" lang="en"> <td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td> <td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 11:17, 21 September 2009</td> </tr><tr><td colspan="2" class="diff-notice" lang="en"><div class="mw-diff-empty">(No difference)</div> </td></tr></table>

Pvl https://labadviser.nanolab.dtu.dk//index.php?title=File:RIE1_150nitride_bgenitr_3.5min.tif&diff=3640&oldid=prev 2009-09-07T14:03:05Z

<p>RIE1 etch profile - 150 nm silicon nitride - recipe &quot;BGE_NITR&quot; (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been removed. Wafer tiltet 45 degrees.</p> <p><b>New page</b></p><div>RIE1 etch profile - 150 nm silicon nitride - recipe &quot;BGE_NITR&quot; (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been removed. Wafer tiltet 45 degrees.</div>

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