https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=File%3ABc_5_7_jpeg.jpgFile:Bc 5 7 jpeg.jpg - Revision history2026-05-08T02:21:22ZRevision history for this page on the wikiMediaWiki 1.43.3https://labadviser.nanolab.dtu.dk//index.php?title=File:Bc_5_7_jpeg.jpg&diff=3710&oldid=prevPvl: RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been removed. Wafer tiltet 45 degrees.2009-09-21T09:37:05Z<p>RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been removed. Wafer tiltet 45 degrees.</p>
<p><b>New page</b></p><div>RIE1 etch profile - 150 nm silicon nitride - recipe "BGE_NITR" (pressure 42 mTorr) - etchtime 3,5 min. The structures are made with e-beam lithography, and the Al etch mask has been removed. Wafer tiltet 45 degrees.</div>Pvl