Deposition of SiN with PECVD4/NEW TESTS QC - Revision history

Mfarin at 13:14, 4 March 2025

2025-03-04T13:14:47Z

← Older revision		Revision as of 15:14, 4 March 2025
Line 34:		Line 34:


	[[File:25W - reflected power QC nitride.png\|thumb\|593x593px\|Reflected power of different tests, ~~whit~~ 25W as the demanded power.\|center]]		[[File:25W - reflected power QC nitride.png\|thumb\|593x593px\|Reflected power of different tests, with 25W as the demanded power.\|center]]


Line 51:		Line 51:
	[[File:100W refractive index ellip vs filmtek.png\|thumb\|435x435px\|Wafers processed with 100W had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]		[[File:100W refractive index ellip vs filmtek.png\|thumb\|435x435px\|Wafers processed with 100W had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]

	[[File:100W reflected power QC nitride.png\|center\|thumb\|593x593px\|Reflected power of different tests, ~~whit~~ 100W as the demanded power.]]		[[File:100W reflected power QC nitride.png\|center\|thumb\|593x593px\|Reflected power of different tests, with 100W as the demanded power.]]

Mfarin at 13:14, 4 March 2025

2025-03-04T13:14:04Z

← Older revision		Revision as of 15:14, 4 March 2025
Line 1:		Line 1:

	'''''Unless otherwise stated, this page is written by DTU Nanolab internal (Feb 2025)), for more info contact mfarin.'''''		'''''Unless otherwise stated, this page is written by DTU Nanolab internal (Feb 2025), for more info contact mfarin.'''''

	== New QC tests on Silicon nitride - PECVD4 ==		== New QC tests on Silicon nitride - PECVD4 ==
Line 9:		Line 9:
	=== Data with HF generator=25W ===		=== Data with HF generator=25W ===
	[[File:25W - thickness PECVD4 nitride QC.png\|left\|thumb\|435x435px\|Data from november to february of 15min QC nitride using 25W. The graph showcases thickness with standard error across time.]]		[[File:25W - thickness PECVD4 nitride QC.png\|left\|thumb\|435x435px\|Data from november to february of 15min QC nitride using 25W. The graph showcases thickness with standard error across time.]]
	[[File:25W - Thickness filmtek vs ellipsometer.png\|thumb\|436x436px\|Wafers had the thickness measured in both Filmtek and Ellipsometer, comparing the results.]]		[[File:25W - Thickness filmtek vs ellipsometer.png\|thumb\|436x436px\|Wafers processed with 25W had the thickness measured in both Filmtek and Ellipsometer, comparing the results.]]


Line 20:		Line 20:

	[[File:25W - refractive index QC nitride.png\|left\|thumb\|435x435px\|Data from november to february of 15min QC nitride using 25W. The graph showcases the refractive index with standard error across time.]]		[[File:25W - refractive index QC nitride.png\|left\|thumb\|435x435px\|Data from november to february of 15min QC nitride using 25W. The graph showcases the refractive index with standard error across time.]]
	[[File:25W - refractive index filmtek vs ellipsometer.png\|thumb\|436x436px\|Wafers had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]		[[File:25W - refractive index filmtek vs ellipsometer.png\|thumb\|436x436px\|Wafers processed with 25W had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]


Line 34:		Line 34:


	[[File:25W - reflected power QC nitride.png\|thumb\|~~596x596px~~\|Reflected power of different tests, whit 25W as the demanded power.\|center]]		[[File:25W - reflected power QC nitride.png\|thumb\|593x593px\|Reflected power of different tests, whit 25W as the demanded power.\|center]]


Line 41:		Line 41:

	=== Data with HF generator=100W ===		=== Data with HF generator=100W ===
			[[File:100W - thickness QC nitride.png\|left\|Data from november to february of 15min QC nitride using 100W. The graph showcases thickness with standard error across time.\|thumb\|435x435px]]
			[[File:100W - thickness ellip vs filmtek.png\|thumb\|435x435px\|Wafers processed with 100W had the thickness measured in both Filmtek and Ellipsometer, comparing the results.]]


Line 46:		Line 48:


			[[File:100W - refractive index QC nitride.png\|left\|thumb\|436x436px\|Data from november to february of 15min QC nitride using 100W. The graph showcases the refractive index with standard error across time.]]
			[[File:100W refractive index ellip vs filmtek.png\|thumb\|435x435px\|Wafers processed with 100W had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]

			[[File:100W reflected power QC nitride.png\|center\|thumb\|593x593px\|Reflected power of different tests, whit 100W as the demanded power.]]
	[[File:100W ~~- thickness~~ QC nitride.png\|~~left~~\|~~Data from november to february~~ of ~~15min QC nitride using~~ 100W. ~~The graph showcases thickness with standard error across time.\|frame~~]]

Mfarin: /* Data with HF generator=100W */

2025-03-04T13:07:22Z

Data with HF generator=100W

← Older revision		Revision as of 15:07, 4 March 2025
Line 41:		Line 41:

	=== Data with HF generator=100W ===		=== Data with HF generator=100W ===
	[[File:100W - thickness QC nitride.png\|left~~\|thumb\|435x435px~~\|Data from november to february of 15min QC nitride using 100W. The graph showcases thickness with standard error across time.]]






			[[File:100W - thickness QC nitride.png\|left\|Data from november to february of 15min QC nitride using 100W. The graph showcases thickness with standard error across time.\|frame]]

Mfarin at 13:05, 4 March 2025

2025-03-04T13:05:37Z

← Older revision		Revision as of 15:05, 4 March 2025
Line 35:		Line 35:

	[[File:25W - reflected power QC nitride.png\|thumb\|596x596px\|Reflected power of different tests, whit 25W as the demanded power.\|center]]		[[File:25W - reflected power QC nitride.png\|thumb\|596x596px\|Reflected power of different tests, whit 25W as the demanded power.\|center]]

Mfarin at 13:05, 4 March 2025

2025-03-04T13:05:06Z

← Older revision		Revision as of 15:05, 4 March 2025
Line 34:		Line 34:


	[[File:25W - reflected power QC nitride.png~~\|left~~\|thumb\|596x596px\|Reflected power of different tests, whit 25W as the demanded power.]]		[[File:25W - reflected power QC nitride.png\|thumb\|596x596px\|Reflected power of different tests, whit 25W as the demanded power.\|center]]

Mfarin at 13:04, 4 March 2025

2025-03-04T13:04:40Z

@@ Line 8: / Line 8: @@
 === Data with HF generator=25W ===
-[[File:25W - thickness PECVD4 nitride QC.png|left|thumb|343x343px|Data from november to february of 15min QC nitride using 25W. The graph showcases thickness with standard error across time.]]
+[[File:25W - thickness PECVD4 nitride QC.png|left|thumb|435x435px|Data from november to february of 15min QC nitride using 25W. The graph showcases thickness with standard error across time.]]
-[[File:25W - Thickness filmtek vs ellipsometer.png|thumb|351x351px|Wafers had the thickness measured in both Filmtek and Ellipsometer, comparing the results.]]
+[[File:25W - Thickness filmtek vs ellipsometer.png|thumb|436x436px|Wafers had the thickness measured in both Filmtek and Ellipsometer, comparing the results.]]
@@ Line 19: / Line 48: @@
 === Data with HF generator=100W ===

Mfarin at 12:55, 4 March 2025

2025-03-04T12:55:37Z

← Older revision		Revision as of 14:55, 4 March 2025
Line 8:		Line 8:

	=== Data with HF generator=25W ===		=== Data with HF generator=25W ===
	[[File:25W - thickness PECVD4 nitride QC.png\|left\|thumb\|343x343px\|Data from november to february of 15min QC nitride using 25W. The ~~grapgh~~ showcases thickness with standard error across time.]]		[[File:25W - thickness PECVD4 nitride QC.png\|left\|thumb\|343x343px\|Data from november to february of 15min QC nitride using 25W. The graph showcases thickness with standard error across time.]]
	[[File:25W - Thickness filmtek vs ellipsometer.png\|thumb\|~~350x350px~~\|Wafers had the thickness measured in both ~~filmtek~~ and ~~ellipsometer~~, comparing the results.]]		[[File:25W - Thickness filmtek vs ellipsometer.png\|thumb\|351x351px\|Wafers had the thickness measured in both Filmtek and Ellipsometer, comparing the results.]]




Line 21:		Line 19:


			[[File:25W - refractive index QC nitride.png\|left\|thumb\|345x345px\|Data from november to february of 15min QC nitride using 25W. The graph showcases the refractive index with standard error across time.]]
			[[File:25W - refractive index filmtek vs ellipsometer.png\|thumb\|353x353px\|Wafers had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]

	=== Data with HF generator=100W ===		=== Data with HF generator=100W ===

Mfarin at 12:50, 4 March 2025

2025-03-04T12:50:55Z

← Older revision		Revision as of 14:50, 4 March 2025
Line 8:		Line 8:

	=== Data with HF generator=25W ===		=== Data with HF generator=25W ===
	[[File:25W - thickness PECVD4 nitride QC.png\|left\|thumb\|~~568x568px~~\|Data from november to february of 15min QC nitride using 25W. The grapgh showcases thickness with standard error across time.]]		[[File:25W - thickness PECVD4 nitride QC.png\|left\|thumb\|343x343px\|Data from november to february of 15min QC nitride using 25W. The grapgh showcases thickness with standard error across time.]]
			[[File:25W - Thickness filmtek vs ellipsometer.png\|thumb\|350x350px\|Wafers had the thickness measured in both filmtek and ellipsometer, comparing the results.]]

Mfarin at 12:47, 4 March 2025

2025-03-04T12:47:46Z

← Older revision		Revision as of 14:47, 4 March 2025
Line 1:		Line 1:

	'''''Unless otherwise stated, this page is written by DTU Nanolab internal (Feb 2025)), for more info contact mfarin.'''''		'''''Unless otherwise stated, this page is written by DTU Nanolab internal (Feb 2025)), for more info contact mfarin.'''''

			== New QC tests on Silicon nitride - PECVD4 ==


	Due to recent instability in the High-Frequency (HF) generator, the thickness deposited during the QC HF Nitride process has not been very reliable. To better control it, new tests were performed. Since the recipe uses 25W of HF, and the main variation was the reflected power—oscillating between ~5W and 10W—higher power levels were tested. When using 100W, the reflected power was significantly more stable. Below, some of the data is presented, comparing 25W and 100W of HF power, as well as results from different characterization tools (Ellipsometer and FilmTek).		Due to recent instability in the High-Frequency (HF) generator, the thickness deposited during the QC HF Nitride process has not been very reliable. To better control it, new tests were performed. Since the recipe uses 25W of HF, and the main variation was the reflected power—oscillating between ~5W and 10W—higher power levels were tested. When using 100W, the reflected power was significantly more stable. Below, some of the data is presented, comparing 25W and 100W of HF power, as well as results from different characterization tools (Ellipsometer and FilmTek).

			=== Data with HF generator=25W ===
			[[File:25W - thickness PECVD4 nitride QC.png\|left\|thumb\|568x568px\|Data from november to february of 15min QC nitride using 25W. The grapgh showcases thickness with standard error across time.]]









			=== Data with HF generator=100W ===

Mfarin at 12:39, 4 March 2025

2025-03-04T12:39:46Z

← Older revision		Revision as of 14:39, 4 March 2025
Line 1:		Line 1:

			'''''Unless otherwise stated, this page is written by DTU Nanolab internal (Feb 2025)), for more info contact mfarin.'''''


	Due to recent instability in the High-Frequency (HF) generator, the thickness deposited during the QC HF Nitride process has not been very reliable. To better control it, new tests were performed. Since the recipe uses 25W of HF, and the main variation was the reflected power—oscillating between ~5W and 10W—higher power levels were tested. When using 100W, the reflected power was significantly more stable. Below, some of the data is presented, comparing 25W and 100W of HF power, as well as results from different characterization tools (Ellipsometer and FilmTek).		Due to recent instability in the High-Frequency (HF) generator, the thickness deposited during the QC HF Nitride process has not been very reliable. To better control it, new tests were performed. Since the recipe uses 25W of HF, and the main variation was the reflected power—oscillating between ~5W and 10W—higher power levels were tested. When using 100W, the reflected power was significantly more stable. Below, some of the data is presented, comparing 25W and 100W of HF power, as well as results from different characterization tools (Ellipsometer and FilmTek).