LabAdviser - Recent changes [en]

Specific Process Knowledge/Polymer Processing/Polymer Processing/Additive methods/Quantum X 2PP

Danmah — Wed, 29 Jul 2026 15:25:24 GMT

Initial edit

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	~~This page~~ is for Quantum X align		[[File:Quantum X align.png\|thumb\|470x470px\|The Nanoscribe Quantum X align in PolyFabLab.]]

			== Introduction ==
			The Nanoscribe Quantum X align is a 3D printer based on two-photon polymerization (2PP) and designed for rapid microfabrication of polymer structures. It features a femtosecond pulsed diode laser operating at 780 nm outputting a laser power of 250 mW. In addition, it is equipped with a sample stage with a 50 × 50 × 20 mm travel range that can fit up to an 8-inch wafer, a confocal module for aligning prints to features on a substrate, a photoresist dispenser, and fiber illumination ports to facilitate the alignment of prints onto optical fibers.

			Job files are prepared using either DeScribeX or NanoPrintX. DeScribeX is used for large prints that exceed the print field of the microscope objective, while NanoPrintX is used for prints that need to be aligned to features on a substrate.
			[[File:Print chamber.png\|center\|thumb\|421x421px\|Print chamber of the Quantum X align with a 25× microscope objective and sample holder mounted.]]

			== Microscope objectives ==
			[[File:Objectives.png\|center\|thumb\|629x629px\|Microscope objectives available for the Quantum X align along with select specifications.]]

			== Photoresists ==
			Photoresists available to use free of charge are IP-Dip2 (for the 63× objective), IP-S (for the 25× objective), and IPX-Q (for the 10× and 5× objectives).

			== Substrates ==
			Substrates available to use free of charge are microscope slides (76 × 26 × 1 mm, silanized or unsilanized) and silicon chips (25 × 25 × 0.725 mm). Silicon wafers (from 1-inch up to 8-inch) can be used. For printing on chips and other small substrates, they can be placed on an adhesive gel-pak. It is also possible to use optical fibers as substrates.

File:Print chamber.png

Danmah — Wed, 29 Jul 2026 15:12:37 GMT

Danmah uploaded File:Print chamber.png

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Print chamber of the Quantum X align.

File:Objectives.png

Danmah — Wed, 29 Jul 2026 14:43:27 GMT

Danmah uploaded File:Objectives.png

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Microscope objectives available for the Quantum X align

File:Quantum X align.png

Danmah — Wed, 29 Jul 2026 14:21:37 GMT

Danmah uploaded File:Quantum X align.png

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Image of the Quantum X align.

Specific Process Knowledge/Polymer Processing/Polymer Processing/Coating/Parylene Coater

Meenadh — Wed, 29 Jul 2026 08:12:13 GMT

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	A parylene coater is the integrated CVD system — vaporiser, pyrolysis furnace, deposition chamber, cold trap, and vacuum system — used to run this process.		A parylene coater is the integrated CVD system — vaporiser, pyrolysis furnace, deposition chamber, cold trap, and vacuum system — used to run this process.

	~~In PolyFabLab, we have the~~ Diener Parylene P6 system and ~~currently allowed~~ dimer is Parylene C.		The '''Diener Parylene P6''' system in PolyFabLab is configured to process multiple parylene types, including '''Parylene C, N, D, and F'''. However, '''Parylene C''' is the only dimer provided as a standard material by DTU Nanolab. The P6 system is compatible with Parylene N, C, D, and F-type dimers.

			Users wishing to deposit '''Parylene N, D, or F''' must first obtain '''chemistry/process approval''' from the '''Safety Coordinator (Majken Becker)'''. Following this approval, the proposed process must be discussed with the '''lab/equipment responsible person (Meena Dhankhar)''' before use.

			Please note that '''Parylene N, D, and F dimers are not stocked by DTU Nanolab'''. Users are responsible for purchasing and supplying these materials themselves.

	===Chemistry in Brief===		===Chemistry in Brief===

Specific Process Knowledge/Back-end processing/PDMS Process Line and Microfluidics

Cchvi — Fri, 24 Jul 2026 09:46:33 GMT

References

Show changes

File:SU-8 pattern.jpg

Cchvi — Thu, 23 Jul 2026 16:34:55 GMT

Cchvi uploaded File:SU-8 pattern.jpg

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SU-8 negative micropattern on silicon wafer fabricated by soft lithography in the clean room for PDMS micromolding

Specific Process Knowledge/Back-end processing/PDMS Process Line and Microfluidics

Cchvi — Thu, 23 Jul 2026 16:32:34 GMT

Soft lithography micro molding

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	'''Fabrication of the soft-litography mold '''		'''Fabrication of the soft-litography mold '''
			[[File:SU-8 on SiO2 wafer soft lithography.jpg\|400px\|thumb\|SU-8 negative micropattern on silicon wafer fabricated by soft lithography in the clean room for PDMS micromolding]]
			[[File:Mold development for casting.jpg\|400px\|thumb\|(Top) Process flow diagram for the development of the mold for casting PDMS (Bottom) Mold development process. (Left) CAD design of the mold. (Center) 3D printed mold. (Right) Wafer with SU8 micropatterns inside casting mold]]
			[[File:PDMS casting in molds.jpg\|400px\|thumb\|PDMS casting in molds by (left) pouring into open mold or (right) injecting into mold inlet]]
			[[File:Curing PDMS in oven.jpg\|400px\|thumb\|(Left) Photo of PDMS in mold curing in oven (Right) Testing for leveling of mold inside oven before curing.]]
			[[File:Demolding.jpg\|400px\|thumb\|Photograph of PDMS demolding (left) and PDMS microfluidic chip demolded (right) ]]

	The microfabrication, ''i.e.'' photolithography and micromachining, of glass or oxidized silicon (Si/SiO2) substrates, is time consuming, resource-intensive and cost prohibitive in many cases. Soft-lithography was developed in the late 1990s by the Whitesides group at Harvard University, as the first method to rapid-prototype microfluidic devices using PDMS soft-elastomers ([https://doi.org/10.1021/AC980656Z Duffy et al., 1998]).		The microfabrication, ''i.e.'' photolithography and micromachining, of glass or oxidized silicon (Si/SiO2) substrates, is time consuming, resource-intensive and cost prohibitive in many cases. Soft-lithography was developed in the late 1990s by the Whitesides group at Harvard University, as the first method to rapid-prototype microfluidic devices using PDMS soft-elastomers ([https://doi.org/10.1021/AC980656Z Duffy et al., 1998]).

	The micropatterns to be replicated in the PDMS are often fabricated with [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/SU-8 SU-8 photolitography] and [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch wet etching] on silicon wafers in the clean room. The PDMS lab is strategically located across the hallway of the PolyFabLab clean room, facilitating a continuous processing and minimizing contamination sources. Other methods for [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Polymer_Processing polymer processing] like additive methods and imprinting are also available for fabricating features with nano to macroscopic dimensions in silicon wafers to be replicated in PDMS.		The micropatterns to be replicated in the PDMS are often fabricated with [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/SU-8 SU-8 photolitography] and [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch wet etching] on silicon wafers in the clean room. The PDMS lab is strategically located across the hallway of the PolyFabLab clean room, facilitating a continuous processing and minimizing contamination sources. Other methods for [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Polymer_Processing polymer processing] like additive methods and imprinting are also available for fabricating features with nano to macroscopic dimensions in silicon wafers to be replicated in PDMS.

	[[File:Mold development for casting.jpg\|400px\|thumb\|(Top) Process flow diagram for the development of the mold for casting PDMS (Bottom) Mold development process. (Left) CAD design of the mold. (Center) 3D printed mold. (Right) Wafer with SU8 micropatterns inside casting mold]]
	~~[[File:PDMS casting in molds.jpg\|400px\|thumb\|PDMS casting in molds by (left) pouring into open mold or (right) injecting into mold inlet]]~~
	~~[[File:Curing PDMS in oven.jpg\|400px\|thumb\|(Left) Photo of PDMS in mold curing in oven (Right) Testing for leveling of mold inside oven before curing.]]~~
	~~[[File:Demolding.jpg\|400px\|thumb\|Photograph of PDMS demolding (left) and PDMS microfluidic chip demolded (right) ]]~~

	'''Fabrication of the casting mold'''		'''Fabrication of the casting mold'''

File:SU-8 on SiO2 wafer soft lithography.jpg

Cchvi — Thu, 23 Jul 2026 16:32:05 GMT

Cchvi uploaded File:SU-8 on SiO2 wafer soft lithography.jpg

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SU-8 negative micropattern on silicon wafer fabricated by soft lithography in the clean room for PDMS micromolding

Specific Process Knowledge/Back-end processing/PDMS Process Line and Microfluidics

Cchvi — Thu, 23 Jul 2026 16:03:48 GMT

Mixing PDMS resin and degassing

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	~~<BR><span style="background:#FF2800">'''THIS PAGE IS UNDER CONSTRUCTION'''</span>~~

	''Unless otherwise stated, all content on this page was created by PolyFabLab staff, DTU Nanolab. The document [https://www.epfl.ch/research/facilities/cmi/equipment/packaging-miscellaneous/pdms-line/ PDMS line] by EPFL was used as a reference for structure''		''Unless otherwise stated, all content on this page was created by PolyFabLab staff, DTU Nanolab. The document [https://www.epfl.ch/research/facilities/cmi/equipment/packaging-miscellaneous/pdms-line/ PDMS line] by EPFL was used as a reference for structure''

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	[[File:PDMS Lab.png\|1000px\|thumb\|center\|Photograph of the different work areas in the PDMS Laboratory at DTU Nanolab]]		[[File:PDMS Lab.png\|1000px\|thumb\|center\|Photograph of the different work areas in the PDMS Laboratory at DTU Nanolab]]

	''Non-cured PDMS'': All mixtures of PDMS resin and curing agent are prepared on this area. Cellophan film is provided and must be placed on the table ALWAYS when working with uncured PDMS. Gloves, a high precision scale, a vacuum desiccator and a ventilated oven are available in this area.		*''Non-cured PDMS'': All mixtures of PDMS resin and curing agent are prepared on this area. Cellophan film is provided and must be placed on the table ALWAYS when working with uncured PDMS. Gloves, a high precision scale, a vacuum desiccator and a ventilated oven are available in this area.

	''Fume hood'': safe area for handling volatile chemicals that are hazardous for human and environment health. The spin-coating machine and the hazardous waste are also located in this area.		*''Fume hood'': safe area for handling volatile chemicals that are hazardous for human and environment health. The spin-coating machine and the hazardous waste are also located in this area.

	''Plasma treatment'': an oxygen plasma equipment to condition the surfaces for bonding of parts in microfluidic devices and a press for pressing the devices to be bonded after plasma treatment are provided in this area.		*''Plasma treatment'': an oxygen plasma equipment to condition the surfaces for bonding of parts in microfluidic devices and a press for pressing the devices to be bonded after plasma treatment are provided in this area.

	''Cured PDMS'': Only cured PDMS can be handled in this area. A stereoscope, cutting mat, light screen, an assortment of tweezers, blades, scalpels, punchers, broken glass waste, and other tools for handling cured PDMS are located in this area.		*''Cured PDMS'': Only cured PDMS can be handled in this area. A stereoscope, cutting mat, light screen, an assortment of tweezers, blades, scalpels, punchers, broken glass waste, and other tools for handling cured PDMS are located in this area.

	''Storage'': available PDMS resin and curing agent, solvents (acetone, ethanol, isopropanol), other chemicals; samples, holders, petri dishes and wafer holders of different sizes; pipettes, micropipettes for viscous liquids, spoons, spatulas; cups, aluminum foil, bags, parafilm and glass slides; other tools and materials.		*''Storage'': available PDMS resin and curing agent, solvents (acetone, ethanol, isopropanol), other chemicals; samples, holders, petri dishes and wafer holders of different sizes; pipettes, micropipettes for viscous liquids, spoons, spatulas; cups, aluminum foil, bags, parafilm and glass slides; other tools and materials.

	''Safety equipment'': Personal protective and emergency equipment like googles, lab coats, [https://www.inside.dtu.dk/en/work-environment/physical-work-environment/laboratorier-og-vaerksteder/oejenskylleflasker-og-noedbrusere emergency shower and eyewasher] are provided for the safety of lab users		*''Safety equipment'': Personal protective and emergency equipment like googles, lab coats, [https://www.inside.dtu.dk/en/work-environment/physical-work-environment/laboratorier-og-vaerksteder/oejenskylleflasker-og-noedbrusere emergency shower and eyewasher] are provided for the safety of lab users

	==Cleanliness requirements==		==Cleanliness requirements==
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	==Mixing PDMS resin and degassing==		==Mixing PDMS resin and degassing==
	[[File:PDMS mixing and degassing.jpg\|~~300px~~\|thumb\|Photograph of PDMS mixing in fume hood and degassing in vacuum dissecator chamber]]		[[File:PDMS mixing and degassing.jpg\|200px\|thumb\|Photograph of PDMS mixing in fume hood and degassing in vacuum dissecator chamber]]

	In the PDMS lab, all handling of uncured PDMS must be handled in the '''UNCURED PDMS AREA''' only. A lining of cellophan must be placed on the table before start working. The commercial [https://www.dow.com/en-us/pdp.sylgard-184-silicone-elastomer-kit.01064291z.html#overview Sylgard 184] silicone base kit including the prepolymer and cross-linker, a.k.a. curing agent (Dow Corning Corporation, Midland, USA) is available in the storage cabinet of the lab.		In the PDMS lab, all handling of uncured PDMS must be handled in the '''UNCURED PDMS AREA''' only. A lining of cellophan must be placed on the table before start working. The commercial [https://www.dow.com/en-us/pdp.sylgard-184-silicone-elastomer-kit.01064291z.html#overview Sylgard 184] silicone base kit including the prepolymer and cross-linker, a.k.a. curing agent (Dow Corning Corporation, Midland, USA) is available in the storage cabinet of the lab.


	The resin and the curing agent are usually mixed in a 10:1 weight ratio, but lower ratios down to 5:1 can be used if it is required to have a less viscous PDMS for casting of intrincate geometries. A high precision balance, and different size containers, pipettes and spatulas are available for the lab users.		The resin and the curing agent are usually mixed in a 10:1 weight ratio, but lower ratios down to 5:1 can be used if it is required to have a less viscous PDMS for casting of intrincate geometries. A high precision balance, and different size containers, pipettes and spatulas are available for the lab users.
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	[[File:Curing PDMS in oven.jpg\|400px\|thumb\|(Left) Photo of PDMS in mold curing in oven (Right) Testing for leveling of mold inside oven before curing.]]		[[File:Curing PDMS in oven.jpg\|400px\|thumb\|(Left) Photo of PDMS in mold curing in oven (Right) Testing for leveling of mold inside oven before curing.]]
	[[File:Demolding.jpg\|400px\|thumb\|Photograph of PDMS demolding (left) and PDMS microfluidic chip demolded (right) ]]		[[File:Demolding.jpg\|400px\|thumb\|Photograph of PDMS demolding (left) and PDMS microfluidic chip demolded (right) ]]

	'''Fabrication of the casting mold'''		'''Fabrication of the casting mold'''

	The wafer containing the micropatterns fabricated with SU8 photolitography is often placed on a casting mold, which can be as simple as a frame, or be a more specialized mold fabricated with 3D printing or machining. Transparent materials like polycarbonate are preferable for molds because they are transparent and allow to monitor the complete degassing of the PDMS once casted. DTU Nanolab offers a variety of 3D printers and a machine shop that the users can access to fabricate their casting molds. For the machine shop at DTU Nanolab contact [https://www.dtu.dk/english/person/soeren-m-b-petersen?id=43543&entity=profile Søren Petersen]. Simple rectangular frames of 28 x 46 mm, and cricular frame for 6 in wafers are available in the lab for the users.		The wafer containing the micropatterns fabricated with SU8 photolitography is often placed on a casting mold, which can be as simple as a frame, or be a more specialized mold fabricated with 3D printing or machining. Transparent materials like polycarbonate are preferable for molds because they are transparent and allow to monitor the complete degassing of the PDMS once casted. DTU Nanolab offers a variety of 3D printers and a machine shop that the users can access to fabricate their casting molds. For the machine shop at DTU Nanolab contact [https://www.dtu.dk/english/person/soeren-m-b-petersen?id=43543&entity=profile Søren Petersen]. Simple rectangular frames of 28 x 46 mm, and cricular frame for 6 in wafers are available in the lab for the users.