LabAdviser - Recent changes [en]

Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma DUV processing

Thes — Fri, 31 Jul 2026 11:59:06 GMT

← Older revision		Revision as of 13:59, 31 July 2026
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	*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>
	*[https://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4212~~ The newest QC data for Spin coater: Süss Stepper] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=279 The newest QC data for Spin coater: Süss Stepper] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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	*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>
	*[https://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4212~~ The newest QC data for Spin coater: Süss Stepper] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=279 The newest QC data for Spin coater: Süss Stepper] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing

Thes — Fri, 31 Jul 2026 11:53:35 GMT

← Older revision		Revision as of 13:53, 31 July 2026
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	*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>
	*[https://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4211~~ The newest QC data for Spin Coater: Gamma UV] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=359 The newest QC data for Spin Coater: Gamma UV] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma E-beam and UV processing

Thes — Fri, 31 Jul 2026 11:51:35 GMT

← Older revision		Revision as of 13:51, 31 July 2026
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	*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma e-beam & UV] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma e-beam & UV] - '''requires login'''<br>
	*[https://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4210~~ The newest QC data for Spin Coater: Gamma e-beam & UV] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=417 The newest QC data for Spin Coater: Gamma e-beam & UV] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing

Thes — Fri, 31 Jul 2026 11:49:52 GMT

← Older revision		Revision as of 13:49, 31 July 2026
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	*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>
	*[https://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4211~~ The newest QC data for Spin Coater: Gamma UV] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=359 The newest QC data for Spin Coater: Gamma UV] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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Specific Process Knowledge/Etch/Etching of Silicon/Si etch using ASE

Thes — Fri, 31 Jul 2026 11:33:56 GMT

Quality control procedure on the ASE

← Older revision		Revision as of 13:33, 31 July 2026
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	*[https://labmanager.dtu.dk/d4Show.php?id=1607&mach=105 The QC procedure for ASE]		*[https://labmanager.dtu.dk/d4Show.php?id=1607&mach=105 The QC procedure for ASE]
	*[https://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~1751~~ The newest QC data for ASE]		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=105 The newest QC data for ASE]

	{\| {{table}}		{\| {{table}}

Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy

Thes — Fri, 31 Jul 2026 11:29:30 GMT

← Older revision		Revision as of 13:29, 31 July 2026
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	'''The user manual, quality control procedure and results and contact information can be found in LabManager:''' <br/>		'''The user manual, quality control procedure and results and contact information can be found in LabManager:''' <br/>
	[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=337 AFM Icon 1 in LabManager]<br>		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=337 AFM Icon 1 in LabManager]<br>
	[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=438 AFM Icon 2 in LabManager]		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=438 AFM Icon 2 in LabManager]

	==Process Information==		==Process Information==

Specific Process Knowledge/Wafer cleaning/IMEC

Thes — Fri, 31 Jul 2026 11:27:08 GMT

← Older revision		Revision as of 13:27, 31 July 2026
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	<!-- remember to remove the type of documents that are not present -->		<!-- remember to remove the type of documents that are not present -->

	Info page for '[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br>		Info page for '[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br>
	Info page for '[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02: Acids/bases]'<br>		Info page for '[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02: Acids/bases]'<br>
	Info page for '[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=411 Wet bench 03: Wafer and mask cleaning]'<br>		Info page for '[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=411 Wet bench 03: Wafer and mask cleaning]'<br>
	Info page for '[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br>		Info page for '[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br>
	Info page for '[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br>		Info page for '[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br>

Specific Process Knowledge/Characterization/XRD/SLSII analysis

Thes — Fri, 31 Jul 2026 11:24:31 GMT

← Older revision		Revision as of 13:24, 31 July 2026
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	It is not easy to evaluate the accuracy of the fit. However, a Rigaku specialist told us that the value of the thickness should be accurate within 1 nm, as it is mostly based on the oscillation frequency, which is relatively simple to fit. The accuracy of the thickness determination probably decreases, however, if there are many layers or graded layers, although those can be included in the fit.		It is not easy to evaluate the accuracy of the fit. However, a Rigaku specialist told us that the value of the thickness should be accurate within 1 nm, as it is mostly based on the oscillation frequency, which is relatively simple to fit. The accuracy of the thickness determination probably decreases, however, if there are many layers or graded layers, although those can be included in the fit.

	For more information on how to use the XRR plugin, read the manual by clicking on the ? in the software or find it here in [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4243 LabManager] - requires login.		For more information on how to use the XRR plugin, read the manual by clicking on the ? in the software or find it here in [https://labmanager.dtu.dk/view_binary.php?fileId=4243 LabManager] - requires login.

	==HRXRD==		==HRXRD==
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	##Adjust the other parameters as wanted.		##Adjust the other parameters as wanted.
	##Press "generate hkl".		##Press "generate hkl".
	For more information on how to use the HRXRD plugin, read the manual by clicking on the ? in the software or find it in [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4242 LabManager] - requires login.		For more information on how to use the HRXRD plugin, read the manual by clicking on the ? in the software or find it in [https://labmanager.dtu.dk/view_binary.php?fileId=4242 LabManager] - requires login.

	===RS viewer===		===RS viewer===
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	##At the bottom, "show area" will highlight the measurement area defined, and offsets can be sent to the goniometer, while areas can be sent to measurement configuration.		##At the bottom, "show area" will highlight the measurement area defined, and offsets can be sent to the goniometer, while areas can be sent to measurement configuration.

	For more information please click on ? in the RS viewer window or see [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4249 LabManager] - requires login.		For more information please click on ? in the RS viewer window or see [https://labmanager.dtu.dk/view_binary.php?fileId=4249 LabManager] - requires login.

	==Texture==		==Texture==
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	##To read out the result, click on "orientation function" in the lower pane.		##To read out the result, click on "orientation function" in the lower pane.

	For more information on how to use the Texture plugin, read the manual by clicking on the ? in the software or see [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4244 LabManager] - requires login.		For more information on how to use the Texture plugin, read the manual by clicking on the ? in the software or see [https://labmanager.dtu.dk/view_binary.php?fileId=4244 LabManager] - requires login.

	==Powder XRD==		==Powder XRD==
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	##Select the target crystalline phase.		##Select the target crystalline phase.

	For more info on these steps, see the manual by clicking ? in the right panel for the plugin (Crystallite Size and Strain, Lattice Parameter Refinement, or Crystallinity) or see [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4247 LabManager] - requires login		For more info on these steps, see the manual by clicking ? in the right panel for the plugin (Crystallite Size and Strain, Lattice Parameter Refinement, or Crystallinity) or see [https://labmanager.dtu.dk/view_binary.php?fileId=4247 LabManager] - requires login

	==Data Visualization==		==Data Visualization==
	The data visualization plugin is mainly used to show data mapping. This could be data acquired with the xy-stage. 1D and 2D data are supported, and 1D graphs can be extracted from 2D plots. It further supports smoothing, background subtraction, and peak search for all loaded data sets in one go.		The data visualization plugin is mainly used to show data mapping. This could be data acquired with the xy-stage. 1D and 2D data are supported, and 1D graphs can be extracted from 2D plots. It further supports smoothing, background subtraction, and peak search for all loaded data sets in one go.

	For more information click on ? in the software to right corner or see [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4251 LabManager] - requires login.		For more information click on ? in the software to right corner or see [https://labmanager.dtu.dk/view_binary.php?fileId=4251 LabManager] - requires login.

	==Data Manager==		==Data Manager==
	The data manager can be used for visualizing several datasets at once. As for the data visualization plugin, it support batch processing of data sets. Data comparison can easily be done and generates a great overview of differences and similarities between samples. It can also be used to concatenate data from several measurements into one data set, which is useful for data from the XRD Powder.		The data manager can be used for visualizing several datasets at once. As for the data visualization plugin, it support batch processing of data sets. Data comparison can easily be done and generates a great overview of differences and similarities between samples. It can also be used to concatenate data from several measurements into one data set, which is useful for data from the XRD Powder.

	For more information click on ? in the software top rigth corner of see [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4250 LabManager] - requires login.		For more information click on ? in the software top rigth corner of see [https://labmanager.dtu.dk/view_binary.php?fileId=4250 LabManager] - requires login.

	==Materials Manager==		==Materials Manager==
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	We recommend downloading the symmetrized cif file for import. When adding materials please consider if the space group is the correct one. We would also prefer if the elastic stiffness tensor is entered into the software for all materials if available, which they often are on the Materials Project site.		We recommend downloading the symmetrized cif file for import. When adding materials please consider if the space group is the correct one. We would also prefer if the elastic stiffness tensor is entered into the software for all materials if available, which they often are on the Materials Project site.

	For information about how to use the plugin please look in section 3.2 in the manual opened by clicking on the ? in the upper right-hand corner or see [~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4246 LabManager] - requires login.		For information about how to use the plugin please look in section 3.2 in the manual opened by clicking on the ? in the upper right-hand corner or see [https://labmanager.dtu.dk/view_binary.php?fileId=4246 LabManager] - requires login.

LabAdviser/314/Preparation 314-307

Thes — Fri, 31 Jul 2026 11:21:07 GMT

Preparation Equipment and Processes

← Older revision		Revision as of 13:21, 31 July 2026
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	2) Quorum Q150T Sputter Coater and Glow discharge		2) Quorum Q150T Sputter Coater and Glow discharge

	[~~http~~://labmanager.dtu.dk/view_binary.php?fileId=3020 Manual]		[https://labmanager.dtu.dk/view_binary.php?fileId=3020 Manual]

	[[File:xxx.jpg\|250px\|left\|thumb\|Location Building 314, Prep Room 03]]<br />		[[File:xxx.jpg\|250px\|left\|thumb\|Location Building 314, Prep Room 03]]<br />

Specific Process Knowledge/Lithography/Baking

Thes — Fri, 31 Jul 2026 11:18:05 GMT

← Older revision		Revision as of 13:18, 31 July 2026
(2 intermediate revisions by the same user not shown)
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	{{cc-nanolab}}		{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%~~20http~~://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Baking click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Baking click here]'''

	[[Category: Equipment\|baking]]		[[Category: Equipment\|baking]]
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	Spincoater: Gamma ebeam & UV:<br /> ~~http~~://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4431~~		Spincoater: Gamma ebeam & UV:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=417

	Spincoater: Gamma UV:<br /> ~~http~~://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4432~~		Spincoater: Gamma UV:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=359

	Developer: TMAH UV-lithography:<br /> ~~http~~://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4434~~		Developer: TMAH UV-lithography:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=329

	Spincoater: Süss stepper:<br /> ~~http~~://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4433~~		Spincoater: Süss stepper:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=279

	Developer: Stepper:<br /> ~~http~~://labmanager.dtu.dk/view_binary.php?~~fileId~~=~~4435~~		Developer: Stepper:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=328


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	The user manual, and contact information can be found in LabManager:		The user manual, and contact information can be found in LabManager:

	[~~http~~://labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=336 Hotplate: 90-110C] - '''requires login'''		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=336 Hotplate: 90-110C] - '''requires login'''

	<br clear="all" />		<br clear="all" />
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	The user manual, and contact information can be found in LabManager:		The user manual, and contact information can be found in LabManager:

	[~~http~~://labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=122 Hotplate 1 (SU8)] - '''requires login'''		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=122 Hotplate 1 (SU8)] - '''requires login'''

	[~~http~~://~~labmanager.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=124 Hotplate 2 (SU8)] - '''requires login'''		[https://labmanagerp.dtu.dk/function.php?module=Machine&view=view&mach=124 Hotplate 2 (SU8)] - '''requires login'''

	[~~http~~://labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=453 Hotplate 3 (SU8)] - '''requires login'''		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=453 Hotplate 3 (SU8)] - '''requires login'''

	[~~http~~://labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=454 Hotplate 4 (SU8)] - '''requires login'''		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=454 Hotplate 4 (SU8)] - '''requires login'''
	<br clear="all" />		<br clear="all" />

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	'''Information about the Süss MicroTec Gamma tools can be found in labadviser:'''		'''Information about the Süss MicroTec Gamma tools can be found in labadviser:'''
	*[~~http~~://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV Spin Coater: Gamma UV]		*[https://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV Spin Coater: Gamma UV]
	*[~~http~~://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV Spin Coater: Gamma e-beam & UV]		*[https://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV Spin Coater: Gamma e-beam & UV]
	*[~~http~~://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography Developer TMAH UV-lithography]		*[https://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography Developer TMAH UV-lithography]
	*[~~http~~://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#S.C3.9CSS_Spinner-Stepper Spin Coater: Süss Stepper]		*[https://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#S.C3.9CSS_Spinner-Stepper Spin Coater: Süss Stepper]
	*[~~http~~://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper Developer: TMAH Stepper]		*[https://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper Developer: TMAH Stepper]

	<br clear="all" />		<br clear="all" />
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	The user manual, and contact information can be found in LabManager:		The user manual, and contact information can be found in LabManager:

	[~~http~~://labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=119 Oven: 110C - 250C] - '''requires login'''		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=119 Oven: 110C - 250C] - '''requires login'''
	<br clear="all" />		<br clear="all" />

	{{:Specific Process Knowledge/Lithography/Pretreatment/Oven_250C}}		{{:Specific Process Knowledge/Lithography/Pretreatment/Oven_250C}}

Specific Process Knowledge/Etch/Etching of Silicon/Si etch using ASE

Thes — Fri, 31 Jul 2026 11:03:00 GMT

← Older revision		Revision as of 13:03, 31 July 2026
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%~~20http~~://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Silicon/Si_etch_using_ASE click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Silicon/Si_etch_using_ASE click here]'''
	<!--Checked for updates on 4/9-2025 - ok/jmli -->		<!--Checked for updates on 4/9-2025 - ok/jmli -->

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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=1607&mach=105 The QC procedure for ASE]		*[https://labmanager.dtu.dk/d4Show.php?id=1607&mach=105 The QC procedure for ASE]
	*[~~http~~://labmanager.dtu.dk/view_binary.php?fileId=1751 The newest QC data for ASE]		*[https://labmanager.dtu.dk/view_binary.php?fileId=1751 The newest QC data for ASE]

	{\| {{table}}		{\| {{table}}

Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride

Thes — Fri, 31 Jul 2026 11:01:36 GMT

← Older revision		Revision as of 13:01, 31 July 2026
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	{{cc-nanolab}}		{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%~~20http~~://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_Nitride click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_Nitride click here]'''

	[[Category: Equipment\|Thin film F]]		[[Category: Equipment\|Thin film F]]
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	'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:'''		'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:'''

	[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=84 4" LPCVD nitride furnace (B2)]		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=84 4" LPCVD nitride furnace (B2)]

	[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=250 6" LPCVD nitride furnace (E3)]		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=250 6" LPCVD nitride furnace (E3)]

	[https://labmanager.dtu.dk/d4Show.php?id=1926 Furnace computer manual]		[https://labmanager.dtu.dk/d4Show.php?id=1926 Furnace computer manual]

Specific Process Knowledge/Etch/Etching of Aluminium

Thes — Fri, 31 Jul 2026 11:00:09 GMT

← Older revision		Revision as of 13:00, 31 July 2026
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	'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''		'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''

	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%~~20http~~://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Aluminium click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Aluminium click here]'''
	<!--Page reviewed by jmli 1/8-2016 -->		<!--Page reviewed by jmli 1/8-2016 -->
	<!-- Ok, jmli 2020-0120 -->		<!-- Ok, jmli 2020-0120 -->
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	!'''Allowed materials'''		!'''Allowed materials'''
	\|In 'Aluminium Etch' bath:		\|In 'Aluminium Etch' bath:
	*See Cross Contamination Sheet for [~~http~~://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Aluminium Etch] bath (require login)		*See Cross Contamination Sheet for [https://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Aluminium Etch] bath (require login)
	In beaker:		In beaker:
	*Any material		*Any material

Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)

Thes — Fri, 31 Jul 2026 10:56:51 GMT

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	[~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=19 RIE2 info page in LabManager]		[https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=19 RIE2 info page in LabManager]

	== Process information ==		== Process information ==
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	[[image:Cluster1a.jpg\|200x200px\|right\|thumb\|RIE1 (part of cluster1) - positioned in cleanroom2]]		[[image:Cluster1a.jpg\|200x200px\|right\|thumb\|RIE1 (part of cluster1) - positioned in cleanroom2]]
	[[image:Cluster2x.jpg\|200x200px\|right\|thumb\|RIE2 (part of cluster2)- positioned in cleanroom3]]		[[image:Cluster2x.jpg\|200x200px\|right\|thumb\|RIE2 (part of cluster2)- positioned in cleanroom3]]
	We have three RIE's. Two (RIE1 and RIE2) for etching silicon based materials (silicon, silicon oxide, silicon nitride) and one (III-V RIE) for etching III-V materials. The hardware of RIE1 and RIE2 is very similar but you cannot count on that identical recipes on RIE1 and RIE2 perform exactly the same. In addition to that the main difference between RIE1 and RIE2 is the cleanness of the two equipment. In rough terms RIE1 is the clean system and the RIE2 is the dirty system. This means that in RIE2 opposed to RIE1 it is allowed to have small amounts of metals exposed to the plasma. Look in the manuals for RIE1 and RIE2 to read the details for this difference (you can find the manuals in LabManager [~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=18 RIE1], [~~http~~://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=19 RIE2]).		We have three RIE's. Two (RIE1 and RIE2) for etching silicon based materials (silicon, silicon oxide, silicon nitride) and one (III-V RIE) for etching III-V materials. The hardware of RIE1 and RIE2 is very similar but you cannot count on that identical recipes on RIE1 and RIE2 perform exactly the same. In addition to that the main difference between RIE1 and RIE2 is the cleanness of the two equipment. In rough terms RIE1 is the clean system and the RIE2 is the dirty system. This means that in RIE2 opposed to RIE1 it is allowed to have small amounts of metals exposed to the plasma. Look in the manuals for RIE1 and RIE2 to read the details for this difference (you can find the manuals in LabManager [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=18 RIE1], [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=19 RIE2]).

	== Process information ==		== Process information ==

Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 6" Polysilicon Furnace

Thes — Fri, 31 Jul 2026 10:07:31 GMT

Standard recipes on the 6" polysilicon furnace (this recipe is being watched in the in the quality assurance program):

← Older revision		Revision as of 12:07, 31 July 2026
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	*[~~http~~://labmanager~~.nanolab~~.dtu.dk/d4Show.php?id=2394&mach=291 The QC procedure for the 6" LPCVD polysilicon furnace]<br>		*[https://labmanager.dtu.dk/d4Show.php?id=2394&mach=291 The QC procedure for the 6" LPCVD polysilicon furnace]<br>
	*[~~http~~://~~www.~~labmanager.nanolab.dtu.dk/view_binary.php?type=data&mach=291 The newest QC data for the 6" LPCVD polysilicon furnace]		*[https://labmanager.nanolab.dtu.dk/view_binary.php?type=data&mach=291 The newest QC data for the 6" LPCVD polysilicon furnace]
	{\| {{table}}		{\| {{table}}
	\| align="center" \|		\| align="center" \|

Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 6" polysilicon furnace

Thes — Fri, 31 Jul 2026 10:06:39 GMT

Standard recipes on the 6" polysilicon furnace (this recipe is being watched in the in the quality assurance program):

← Older revision		Revision as of 12:06, 31 July 2026
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	*[~~http~~://labmanager~~.nanolab~~.dtu.dk/d4Show.php?id=2394&mach=291 The QC procedure for the 6" LPCVD polysilicon furnace]<br>		*[https://labmanager.dtu.dk/d4Show.php?id=2394&mach=291 The QC procedure for the 6" LPCVD polysilicon furnace]<br>
	*[~~http~~:/~~/www.~~labmanager~~.nanolab~~.dtu.dk/view_binary.php?type=data&mach=291 The newest QC data for the 6" LPCVD polysilicon furnace]		*[https:/labmanager.dtu.dk/view_binary.php?type=data&mach=291 The newest QC data for the 6" LPCVD polysilicon furnace]
	{\| {{table}}		{\| {{table}}
	\| align="center" \|		\| align="center" \|

Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace

Thes — Fri, 31 Jul 2026 09:52:03 GMT

Quality Control - Recipe Parameters and Limits

← Older revision		Revision as of 11:52, 31 July 2026
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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=2847&mach=82 The QC procedure for Phosphorus drive-in furnace (A3)]<br>		*[https://labmanager.dtu.dk/d4Show.php?id=2847&mach=82 The QC procedure for Phosphorus drive-in furnace (A3)]<br>
	*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=82 The newest QC data for wet and dry oxide]<br>		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=82 The newest QC data for wet and dry oxide]<br>

Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 4" Polysilicon Furnace

Thes — Fri, 31 Jul 2026 09:49:58 GMT

Standard recipe on the 4" polysilicon furnace (this recipe is being watched in the in the quality assurance program):

← Older revision		Revision as of 11:49, 31 July 2026
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	*[~~http~~://labmanager~~.nanolab~~.dtu.dk/d4Show.php?id=1691&mach=86 The QC procedure for the 4" LPCVD polysilicon furnace]<br>		*[https://labmanager.dtu.dk/d4Show.php?id=1691&mach=86 The QC procedure for the 4" LPCVD polysilicon furnace]<br>
	*[~~http~~://~~www.~~labmanager~~.nanolab~~.dtu.dk/view_binary.php?type=data&mach=86 The newest QC data for the 4" polysilicon furnace]		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=86 The newest QC data for the 4" polysilicon furnace]
	{\| {{table}}		{\| {{table}}
	\| align="center" \|		\| align="center" \|

Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 4" polysilicon furnace

Thes — Fri, 31 Jul 2026 09:47:50 GMT

Standard recipe on the 4" polysilicon furnace (this recipe is being watched in the in the quality assurance program):

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	*[~~http~~://labmanager~~.nanolab~~.dtu.dk/d4Show.php?id=1691&mach=86 The QC procedure for the 4" LPCVD polysilicon furnace]<br>		*[https://labmanager.dtu.dk/d4Show.php?id=1691&mach=86 The QC procedure for the 4" LPCVD polysilicon furnace]<br>
	*[~~http~~://~~www.~~labmanager~~.nanolab~~.dtu.dk/view_binary.php?type=data&mach=86 The newest QC data for the 4" polysilicon furnace]		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=86 The newest QC data for the 4" polysilicon furnace]
	{\| {{table}}		{\| {{table}}
	\| align="center" \|		\| align="center" \|

Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma DUV processing

Thes — Fri, 31 Jul 2026 09:46:31 GMT

Quality Control (QC)

← Older revision		Revision as of 11:46, 31 July 2026
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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>
	*[~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper] - '''requires login'''<br>
	*[~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper] - '''requires login'''
	{\| {{table}}		{\| {{table}}
	\| align="center" \|		\| align="center" \|

Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing

Thes — Fri, 31 Jul 2026 09:43:02 GMT

Quality Control (QC)

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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>
	*[~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4211 The newest QC data for Spin Coater: Gamma UV] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?fileId=4211 The newest QC data for Spin Coater: Gamma UV] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma UV] - '''requires login'''<br>
	*[~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4211 The newest QC data for Spin Coater: Gamma UV] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?fileId=4211 The newest QC data for Spin Coater: Gamma UV] - '''requires login'''
	{\| {{table}}		{\| {{table}}
	\| align="center" \|		\| align="center" \|

Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma E-beam and UV processing

Thes — Fri, 31 Jul 2026 09:38:11 GMT

Quality Control (QC)

← Older revision		Revision as of 11:38, 31 July 2026
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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma e-beam & UV] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma e-beam & UV] - '''requires login'''<br>
	*[~~http~~://labmanager.dtu.dk/view_binary.php?fileId=4210 The newest QC data for Spin Coater: Gamma e-beam & UV] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?fileId=4210 The newest QC data for Spin Coater: Gamma e-beam & UV] - '''requires login'''
	{\| {{table}}		{\| {{table}}
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	*[~~http~~://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma e-beam & UV] - '''requires login'''<br>		*[https://labmanager.dtu.dk/d4Show.php?id=5123&mach=359 The QC procedure for Spin Coater: Gamma e-beam & UV] - '''requires login'''<br>
	*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=417 The newest QC data for Spin Coater: Gamma e-beam & UV] - '''requires login'''		*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=417 The newest QC data for Spin Coater: Gamma e-beam & UV] - '''requires login'''
	{\| {{table}}		{\| {{table}}

Specific Process Knowledge/Back-end processing/PDMS Process Line and Microfluidics

Meenadh — Thu, 30 Jul 2026 13:11:05 GMT

← Older revision		Revision as of 15:11, 30 July 2026
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	''Unless otherwise stated, all content on this page was created by PolyFabLab staff, DTU Nanolab. The document [https://www.epfl.ch/research/facilities/cmi/equipment/packaging-miscellaneous/pdms-line/ PDMS line] by EPFL was used as a reference for structure''		''Unless otherwise stated, all content on this page was created by PolyFabLab staff, DTU Nanolab. The document [https://www.epfl.ch/research/facilities/cmi/equipment/packaging-miscellaneous/pdms-line/ PDMS line] by EPFL was used as a reference for the structure''

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS click here]'''
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	==PDMS Process line at DTU Nanolab==		==PDMS Process line at DTU Nanolab==

	Polydimethylsiloxane (PDMS), is a popular silicone elastomer for fabricating microfluidic devices and micro-total analytical systems (μTAS) with applications in life sciences, physics, chemistry, and more. The microfluidic devices integrate channels, chambers, porous membranes, valves and actuators, electrodes, optical paths, and more; and are often interfaced with living cells to biomimic organ and tissue functions. ~~The rapid-~~prototyping of PDMS enables fast ~~and~~ low cost iteration for development of microfluidic structures.		Polydimethylsiloxane (PDMS), is a popular silicone elastomer for fabricating microfluidic devices and micro-total analytical systems (μTAS) with applications in life sciences, physics, chemistry, and more. The microfluidic devices integrate channels, chambers, porous membranes, valves and actuators, electrodes, optical paths, and more; and are often interfaced with living cells to biomimic organ and tissue functions. Rapid prototyping of PDMS enables fast, low-cost iteration for the development of microfluidic structures.

	DTU Nanolab has a dedicated laboratory for ~~the~~ processing ~~of PDMS~~ and fabrication ~~of microfluidics~~ located in building 347. The PDMS Lab is part of the [https://www.nanolab.dtu.dk/polyfablab PolyFabLab], which opened its doors in 2026. PolyFabLab has been equipped with brand-new instruments funded by the [https://novonordiskfonden.dk/ Novo Nordisk Foundation], alongside selected equipment and processes from previous facilities.		DTU Nanolab has a dedicated laboratory for PDMS processing and microfluidics fabrication located in building 347. The PDMS Lab is part of the [https://www.nanolab.dtu.dk/polyfablab PolyFabLab], which opened its doors in 2026. PolyFabLab has been equipped with brand-new instruments funded by the [https://novonordiskfonden.dk/ Novo Nordisk Foundation], alongside selected equipment and processes from previous facilities.

	The process line for PDMS at DTU Nanolab is described in this website. The reader is referred to literature reviews for a deeper description of PDMS processing and applications. ([https://doi.org/10.3390/MI12111350 Lin & Chung, 2021]; [https://doi.org/10.1016/J.ACA.2020.09.013 Morbioli et al., 2020])		The process line for PDMS at DTU Nanolab is described on this website. The reader is referred to literature reviews for a deeper description of PDMS processing and applications. ([https://doi.org/10.3390/MI12111350 Lin & Chung, 2021]; [https://doi.org/10.1016/J.ACA.2020.09.013 Morbioli et al., 2020])

	== Working areas in the PDMS lab ==		== Working areas in the PDMS lab ==

Specific Process Knowledge/Polymer Processing/Polymer Processing/Additive methods/Quantum X 2PP

Danmah — Wed, 29 Jul 2026 15:25:24 GMT

Initial edit

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	~~This page~~ is for Quantum X align		[[File:Quantum X align.png\|thumb\|470x470px\|The Nanoscribe Quantum X align in PolyFabLab.]]

			== Introduction ==
			The Nanoscribe Quantum X align is a 3D printer based on two-photon polymerization (2PP) and designed for rapid microfabrication of polymer structures. It features a femtosecond pulsed diode laser operating at 780 nm outputting a laser power of 250 mW. In addition, it is equipped with a sample stage with a 50 × 50 × 20 mm travel range that can fit up to an 8-inch wafer, a confocal module for aligning prints to features on a substrate, a photoresist dispenser, and fiber illumination ports to facilitate the alignment of prints onto optical fibers.

			Job files are prepared using either DeScribeX or NanoPrintX. DeScribeX is used for large prints that exceed the print field of the microscope objective, while NanoPrintX is used for prints that need to be aligned to features on a substrate.
			[[File:Print chamber.png\|center\|thumb\|421x421px\|Print chamber of the Quantum X align with a 25× microscope objective and sample holder mounted.]]

			== Microscope objectives ==
			[[File:Objectives.png\|center\|thumb\|629x629px\|Microscope objectives available for the Quantum X align along with select specifications.]]

			== Photoresists ==
			Photoresists available to use free of charge are IP-Dip2 (for the 63× objective), IP-S (for the 25× objective), and IPX-Q (for the 10× and 5× objectives).

			== Substrates ==
			Substrates available to use free of charge are microscope slides (76 × 26 × 1 mm, silanized or unsilanized) and silicon chips (25 × 25 × 0.725 mm). Silicon wafers (from 1-inch up to 8-inch) can be used. For printing on chips and other small substrates, they can be placed on an adhesive gel-pak. It is also possible to use optical fibers as substrates.

File:Print chamber.png

Danmah — Wed, 29 Jul 2026 15:12:37 GMT

Danmah uploaded File:Print chamber.png

New page

Print chamber of the Quantum X align.

File:Objectives.png

Danmah — Wed, 29 Jul 2026 14:43:27 GMT

Danmah uploaded File:Objectives.png

New page

Microscope objectives available for the Quantum X align

File:Quantum X align.png

Danmah — Wed, 29 Jul 2026 14:21:37 GMT

Danmah uploaded File:Quantum X align.png

New page

Image of the Quantum X align.

Specific Process Knowledge/Polymer Processing/Polymer Processing/Coating/Parylene Coater

Meenadh — Wed, 29 Jul 2026 08:12:13 GMT

← Older revision		Revision as of 10:12, 29 July 2026
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	A parylene coater is the integrated CVD system — vaporiser, pyrolysis furnace, deposition chamber, cold trap, and vacuum system — used to run this process.		A parylene coater is the integrated CVD system — vaporiser, pyrolysis furnace, deposition chamber, cold trap, and vacuum system — used to run this process.

	~~In PolyFabLab, we have the~~ Diener Parylene P6 system and ~~currently allowed~~ dimer is Parylene C.		The '''Diener Parylene P6''' system in PolyFabLab is configured to process multiple parylene types, including '''Parylene C, N, D, and F'''. However, '''Parylene C''' is the only dimer provided as a standard material by DTU Nanolab. The P6 system is compatible with Parylene N, C, D, and F-type dimers.

			Users wishing to deposit '''Parylene N, D, or F''' must first obtain '''chemistry/process approval''' from the '''Safety Coordinator (Majken Becker)'''. Following this approval, the proposed process must be discussed with the '''lab/equipment responsible person (Meena Dhankhar)''' before use.

			Please note that '''Parylene N, D, and F dimers are not stocked by DTU Nanolab'''. Users are responsible for purchasing and supplying these materials themselves.

	===Chemistry in Brief===		===Chemistry in Brief===