Specific Process Knowledge/Thermal Process/Dope with Boron
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Revision as of 14:56, 7 February 2008 by 192.38.87.76 (talk)
Dope with boron
The furnace A2 boron predep can be used to predeposit silicon wafers with boron. The silicon wafers are positioned in a silicon carbide boat just next to wafers of boron nitride. Boron is predeposited on the silicon wafers. -Rune, hvad er det der sker?
The concentration of boron in the wafer depends on the process temperature. The depth profile depends of the process time