Specific Process Knowledge/Thermal Process/Dope with Boron: Difference between revisions
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image:borprofil_16tim.jpg|16 hours | image:borprofil_16tim.jpg|16 hours | ||
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<gallery caption="Boron profiles from SIMS " widths="200px" heights="200px" perrow="3"> | |||
image:borDiffusionDepthtable.jpg | |||
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Revision as of 11:36, 18 February 2008
Dope with boron
The furnace A2 boron predep can be used to predeposit silicon wafers with boron. The silicon wafers are positioned in a silicon carbide boat just next to wafers of boron nitride. Boron is predeposited on the silicon wafers. -Rune, hvad er det der sker?
The concentration of boron in the wafer depends on the process temperature. The depth profile depends of the process time.
- Boron profiles from SIMS
1 hour
6 hours
16 hours
<gallery caption="Boron profiles from SIMS " widths="200px" heights="200px" perrow="3"> image:borDiffusionDepthtable.jpg image:borDiffusionDepthplot.jpg