Specific Process Knowledge/Lithography/LiftOff
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Revision as of 13:37, 9 August 2013 by Tigre (talk | contribs) (Created page with "==Lift-off wet bench== 300x300px|thumb|Acetone lift-off: positioned in cleanroom 3 This bench is only for wafers with metal! Here are the main ...")
Lift-off wet bench
This bench is only for wafers with metal!
Here are the main rules for lift-off bench use:
- Place the wafers in a dedicated wafer holder.
- Put the holder in the acetone and start the ultrasound. The strip off time is depending of resist thickness.
- Rinse your wafers for 4-5 min. in running water after stripping.
Find more info about the lift-off process here: Specific Process Knowledge/Photolithography/AZ5214E standard resist - reverse process