Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Revision history

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9 October 2023

8 September 2023

  • curprev 12:5412:54, 8 September 2023‎ Thope talk contribs‎ 831 bytes +831‎ Created page with "This page is under construction. In time we will fill it with relevant process examples and relevant data. =Single spot EBL= Arrays of circular holes can be created by normal area writing of a mask of circular structures. It can however also be done with a single spot approach, where the beam will dwell at each spot for several µs and hence each spot will become a circular structure by local over exposure. You can read more about this method in the linked article. '''..."
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