Specific Process Knowledge/Direct Structure Definition: Difference between revisions
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== Choose method of structuring/equipment == | == Choose method of structuring/equipment == | ||
* [[Specific Process Knowledge/Lithography/UVLithography|UV Lithography]] | |||
* [[Specific Process Knowledge/Lithography/3DLithography|2-Photon Polymerization Lithography]] | * [[Specific Process Knowledge/Lithography/3DLithography|2-Photon Polymerization Lithography]] | ||
* [[Specific Process Knowledge/Lithography/NanoImprintLithography|Nano Imprint Lithography]] | |||
* [[Specific Process Knowledge/Back-end processing/Polymer Injection Molder|Polymer Injection Molder]] | * [[Specific Process Knowledge/Back-end processing/Polymer Injection Molder|Polymer Injection Molder]] | ||
* [[Specific Process Knowledge/Back-end processing/Laser Micromachining Tool|Laser Micromachining Tool/ablation]] | * [[Specific Process Knowledge/Back-end processing/Laser Micromachining Tool|Laser Micromachining Tool/ablation]] | ||
* [[Specific Process Knowledge/Back-end processing/Disco Saw|Dicing saw]] | * [[Specific Process Knowledge/Back-end processing/Disco Saw|Dicing saw]] | ||
Revision as of 16:17, 6 October 2014
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Direct Structure Definiton
By direct structure definition we mean that you form the structures for you device directly in the material that the device consist of without any masking steps. Some of the techniques may require a master.
Choose method of structuring/equipment
- UV Lithography
- 2-Photon Polymerization Lithography
- Nano Imprint Lithography
- Polymer Injection Molder
- Laser Micromachining Tool/ablation
- Dicing saw
Materials for structuring
- Polymers
- Metals/Silicon/Graphene
- Glass
Comparison of equipment/material
| Nano Imprint Lithography | UV Lithography | 2-Photon Polymerization Lithography | Polymer Injection Molder | Laser Micromachining Tool | Dicing saw | |
|---|---|---|---|---|---|---|
| General description | ||||||
| Allowed materials | 1 | 2 | 3 | 4 | 5 | 6 |
| Sample sizes | 1 | 2 | 3 | 4 | 5 | 6 |
| Prerequisites | 1 | 2 | 3 | 4 | 5 | 6 |
| Pattern generation | 1 | 2 | 3 | 4 | 5 | 6 |
| Throughput | 1 | 2 | 3 | 4 | 5 | 6 |
| Min/max featuresize | 1 | 2 | 3 | 4 | 5 | 6 |
| Min/max aspect-ratio | 1 | 2 | 3 | 4 | 5 | 6 |
| Post-treatment | 1 | 2 | 3 | 4 | 5 | 6 |
| Patterning degree of freedom | 1 | 2 | 3 | 4 | 5 | 6 |