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Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Remove resist in the AOE

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< Specific Process Knowledge‎ | Etch‎ | AOE (Advanced Oxide Etch)

Revision as of 08:39, 26 May 2011 by BGE (talk | contribs) (→‎Remove AZ resist in the AOE using the recipe Descum)

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Remove AZ resist in the AOE using the recipe Descum

Parameter	Descum
Coil Power [W]	1000
Platen Power [W]	30
Platen temperature [^oC]	0
O $_{2}$ flow [sccm]	99
Pressure [mTorr]	10.0 (strike pressure 20.0 mTorr)

Typical results	tested by bge@danchip
AZ resist etch rate	~41 nm/s

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