Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Nanoscale silicon nitride etch with SF6
THIS PAGE IS UNDER CONSTRUCTION
Nano scale etching of silicon nitride with SF6 plasma
Based on silicon etch recipe made by Henri Jansen.
| Parameter | Silicon nitride etch, platen only |
|---|---|
| SF6 (sccm) | 5 |
| Pressure (APC %) | 100 |
| Platen power (W) | 20 |
| Temperature (oC) | 20 |
- Silicon nitride etch down to Al2O3 with ZEP resist mask (180 nm), 12 min, made by Berit Herstrøm @Nanolab, 2022
-
Good in several linewidth opening -
Good in open areas -
Fairly straight sidewalls
