Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
New page: Deposition of Silicon Nitride can be done with either LPCVD, PECVD or sputter deposition. ==Using LPCVD== LPCVD nitride can be made in the LPCVD nitride furnace. It is a batch process mea... |
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==Using PECVD== | ==Using PECVD== | ||
PECVD nitride can be deposited in one of the PECVD systems. You can run 1-3 wafers at a time depending on which one of the PECVD's you use. The deposition takes place at 300 degrees celcius | PECVD nitride can be deposited in one of the PECVD systems. You can run 1-3 wafers at a time depending on which one of the PECVD's you use. The deposition takes place at 300 degrees celcius. This can be a off importance for some applications but it give a less dense film that is non-stoichiometric. then form is more like SixNyHz. The stepcoverage and thickness uniformity of the film is not as good as for the LPCVD nitride. | ||
==Using sputter deposition== | ==Using sputter deposition== | ||
Revision as of 11:51, 18 October 2007
Deposition of Silicon Nitride can be done with either LPCVD, PECVD or sputter deposition.
Using LPCVD
LPCVD nitride can be made in the LPCVD nitride furnace. It is a batch process meaning you can run a batch of 25 wafers at a time. The deposition takes place at temperatures of 800-850 degrees celcius. The LPCVD nitride covers sidewalls well and the filmthickness is very uniform over the wafer. We have two standard LPCVD nitride processes: One for depositing stoichiometric nitride (Si3N4) and one for deposition low stress nitride (SNR).
Using PECVD
PECVD nitride can be deposited in one of the PECVD systems. You can run 1-3 wafers at a time depending on which one of the PECVD's you use. The deposition takes place at 300 degrees celcius. This can be a off importance for some applications but it give a less dense film that is non-stoichiometric. then form is more like SixNyHz. The stepcoverage and thickness uniformity of the film is not as good as for the LPCVD nitride.