Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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At the moment we have one LPCVD furnace for nitride depositions. | |||
==A few words about the furnace== | |||
The furnace is a Tempress horisontal furnace. | |||
==Process Knowledge== | |||
[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD|Deposition of Silicon Nitride using LPCVD]] | |||
Revision as of 10:25, 23 October 2007
At the moment we have one LPCVD furnace for nitride depositions.
A few words about the furnace
The furnace is a Tempress horisontal furnace.