Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions
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This is a short quick guide to operating the 2D mark detection system, the full manual from JEOL (30 pages) can be found here: '''[[:File:2D mark detecting 20171212.pdf]]''' | This is a short quick guide to operating the 2D mark detection system, the full manual from JEOL (30 pages) can be found here: '''[[:File:2D mark detecting 20171212.pdf]]''' | ||
'''Getting started''' | |||
* you need to make a reference image in the SEM mode, and save as '''reference''' | |||
[[image:SEM settings.jpg|50px]] | |||
[[image:Image saving - reference.jpg|50px]] | |||
[[image:Mark detection.jpg|50px]] | |||
It is importaint to select the condition files with a _ 2D extension like: xna_apy_2D, since some settings are changed so either the 2D detector is used or not! | |||
Latest revision as of 10:51, 27 January 2020
THIS PAGE IS UNDER CONSTRUCTION
In December 2017 we acquired a 2D mark detection system to aid troublesome detection on marks and extend the possibilities on the JEOL E-beam.
This is a short quick guide to operating the 2D mark detection system, the full manual from JEOL (30 pages) can be found here: File:2D mark detecting 20171212.pdf
Getting started
- you need to make a reference image in the SEM mode, and save as reference
It is importaint to select the condition files with a _ 2D extension like: xna_apy_2D, since some settings are changed so either the 2D detector is used or not!