Specific Process Knowledge: Difference between revisions

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<center><span style="background:Yellow">2nd Level - Process Topic</span></center>
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=== Choose the process topic you are interested in ===
=== Choose the process topic you are interested in: ===
*[[/Pattern Design|Pattern Design and Mask Fabrication]]


*[[/Back-end processing|Back-end processing]]
*[[/Back-end processing|Back-end processing]]
*[[/Bonding|Bonding]]


*[[/Characterization|Characterization]]
*[[/Characterization|Characterization]]


*[[/E-beam lithography|E-beam lithography]]
*[[/Direct Structure Definition|Direct Structure Definition]]
 
*[[/Doping|Doping]]


*[[/Etch|Etch]]
*[[/Etch|Etch]]
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*[[/Imprinting|Imprinting]]
*[[/Imprinting|Imprinting]]


*[[/Lithography|Lithography]] - '''New entry by the 18th of September - take a look'''
*[[/Lithography|Lithography]]
 
*[[/Photolithography|Photolithography]]


*[[/Thermal Process|Thermal Process]]
*[[/Thermal Process|Thermal Process]]
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*[[/Wafer and sample drying|Wafer and sample drying]]
*[[/Wafer and sample drying|Wafer and sample drying]]


*[[/Bonding|Wafer Bonding]]
*[[/Wafer cleaning|Wafer Cleaning]]
 
*[[/Wafer Information|Wafer Information]]


*[[/Overview of Fume Hoods|Overview of Fume Hoods]]


*[[/Wafer cleaning|Wafer Cleaning]]
*[[/Cleanroom Chemicals|List of chemicals available in the cleanroom]]


*[[/Wafer Information|Wafer Information]]


*[[/III-V Process|III-V Process]]
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Latest revision as of 14:05, 28 June 2023