Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests C4F8/H2: Revision history

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    14 December 2023

    • curprev 13:4613:46, 14 December 2023‎ Mfarin talk contribs‎ 1,723 bytes +1,723‎ Created page with "===Recipes and results - <span style="background:#FFD850">C<sub>4</sub>F<sub>8</sub> / H<sub>2</sub> tests</span> === {| border="1" cellspacing="1" cellpadding="1" align="left" ! '''Recipe''' ! '''Recipe parameters''' ! '''Process time''' ! '''Date''' ! '''SEM picture''' ! '''Etch rate in SiO2''' ! '''Etch rate in resist <br> (AZ5214E inverse)''' ! '''Selectivity <br> (SiO2:resist)''' |- |- |-style="background:white; color:black" |<!-- '''recipe name''' --> SiO2_ICP |<..."
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